First results from a new 248-nm CD measurement system for future mask and reticle generation

Gerhard W.B. Schlueter; Gerd Scheuring; Juergen Helbing; Sigrid Lehnigk; Hans-Juergen Brueck

doi:10.1117/12.425077

9 April 2001 First results from a new 248-nm CD measurement system for future mask and reticle generation

Gerhard W.B. Schlueter, Gerd Scheuring, Juergen Helbing, Sigrid Lehnigk, Hans-Juergen Brueck

Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425077
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany

Abstract

To keep pace with continuous shrinking design rules for masks and reticles a new 248 nm CD measurement system has been developed. The step to a shorter illumination wavelength leads to a better optical resolution power resulting in an improved CD linearity compared to systems using white light or I-line illumination for imaging. An overview of the system configuration is presented and first results of the improved optical performance as well as CD linearity and CD repeatability data are shown.

Citation Download Citation

Gerhard W.B. Schlueter, Gerd Scheuring, Juergen Helbing, Sigrid Lehnigk, and Hans-Juergen Brueck "First results from a new 248-nm CD measurement system for future mask and reticle generation", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); https://doi.org/10.1117/12.425077

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