PROCEEDINGS VOLUME 4405
MICROELECTRONIC AND MEMS TECHNOLOGIES | 30 MAY - 1 JUNE 2001
Process and Equipment Control in Microelectronic Manufacturing II
Editor(s): Martin Fallon
Editor Affiliations +
IN THIS VOLUME

4 Sessions, 20 Papers, 0 Presentations, 0 Posters
MICROELECTRONIC AND MEMS TECHNOLOGIES
30 May - 1 June 2001
Edinburgh, United Kingdom
SPC, Modeling, and Defectivity
Laurie McTurk
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425237
Jim McGinty, Chris Porteous, Dave McAlpine, Martin Fallon
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425251
Cheng-Fu Hsu, W. C. Chang, Chin-Hsiang Lin, C. C. Hiang
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425252
William L. Benard, Michael A. Huff
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425253
Control of Process Equipment and Materials
K. C. Wu, H. H. Liu, Yuan-Ko Hwang, Shih-Shiung Chen
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425254
Laurence Vallier, Vincent Le Roux, Gilles Borsoni, Michael L. Korwin-Pawlowski
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425255
Pierre Boher, Jean-Philippe Piel, Patrick Evard, Christophe Defranoux, Jean-Louis P. Stehle
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425256
Arthur E.B. Tay, Khiang Wee Lim, Ai Poh Loh, Woei Wan Tan, Weng Khuen Ho, Anya Huang, Fu Jun
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425238
Cinzia Caliendo, P. Imperatori, Enrico Verona
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425239
H. H. Liu, K. C. Wu, Yuan-Ko Hwang, Shih-Shiung Chen
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425240
Jean-Marie R. Dilhac, Benjamin Morillon, Christian Ganibal, Christine Anceau
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425241
John D. Rose
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425242
Photo and Etch Process Control
Robert L. Campbell, Bo Su, Terry L. Seregely, Steve Wallace, Frances H. Schantz
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425243
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425244
Jeremy W. Epton, Deborah L. Jarrett, Ian J. Doohan
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425245
Terry Dyer, Ian J. Doohan, Martin Fallon, Dave McAlpine, Adam Aitkenhead, Jim McGinty, M. Taylor, Philip Gravelle, A. Schouten, et al.
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425246
Gerhard Spitzlsperger, Andreas Rupp, Heike Lorenz
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425247
Cheng-Fu Hsu
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425248
Poster Session
Brian Martin, Tom Tighe
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425249
Vladimir V. Shchennikov, Andrew Yu. Derevskov, Vladimir I. Osotov, Sergey V. Ovsyannikov
Proceedings Volume Process and Equipment Control in Microelectronic Manufacturing II, (2001) https://doi.org/10.1117/12.425250
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