Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur

Mark J. Davis; Alexander J. Marker III; Lutz Aschke; Fredi Schubert; Ewald Moersen; Heiko Kohlmann; Ina Mitra; Jochen Alkemper; Rudolf W. Mueller; John S. Taylor; Kenneth L. Blaedel; Scott Daniel Hector

doi:10.1117/12.446884

2 November 2001 Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur

Mark J. Davis, Alexander J. Marker III, Lutz Aschke, Fredi Schubert, Ewald Moersen, Heiko Kohlmann, Ina Mitra, Jochen Alkemper, Rudolf W. Mueller, John S. Taylor, Kenneth L. Blaedel, Scott Daniel Hector

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Proceedings Volume 4452, Inorganic Optical Materials III; (2001) https://doi.org/10.1117/12.446884
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

Detailed thermal expansion measurements and internal homogeneity measurements of the glass-ceramic material Zerodur were undertaken to examine its usefulness for EUVL. Repeat measurements on 100-mm long samples from three castings exhibit an expansion of approximately 12 +/- 2 ppb/K 2 (sigma) in the temperature range of interest for EUVL, corresponding to Class C of the draft SEMI 3148 standard. Internal homogeneity measurements reveal extremely small refractive index variations, suggesting comparably small compositional variations. This in turn is viewed as a necessary but not sufficient condition for high CTE uniformity, a factor required by EUVL applications.

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Mark J. Davis, Alexander J. Marker III, Lutz Aschke, Fredi Schubert, Ewald Moersen, Heiko Kohlmann, Ina Mitra, Jochen Alkemper, Rudolf W. Mueller, John S. Taylor, Kenneth L. Blaedel, and Scott Daniel Hector "Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur", Proc. SPIE 4452, Inorganic Optical Materials III, (2 November 2001); https://doi.org/10.1117/12.446884

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