Paper
14 November 2001 Intense XUV source of radiation within the 4- to 45-nm spectral range based on capillary discharge plasmas
Alexander P. Shevelko, Larry V. Knight, R. Steven Turley, Oleg F. Yakushev
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Abstract
A compact device, based on fast capillary discharge plasmas, is an intense EUV and soft x-ray source of radiation. Th plasma is created by a discharge of low-inductance capacitors through a gas-filled ceramic capillary. Parameters of the discharge are: maximum current of 25 kA at applied voltage 40 kV, a pulse duration of 20-30 ns at FWHM, and a rise time of 1.5 ns. The soft x-ray and EUV emission of multiply charged ions is investigated using a compact 1 meter grazing incidence spectrometer-monochromator with a constant angle of deviation. The use of various gases allows the observation of XUV spectra in a wide spectral range (4- 45 nm). A Xe-filled capillary discharge shows intense radiation near 13.5 nm - the region of interest for EUV lithography applications. A reflectometer is used for testing grazing incidence gratings.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander P. Shevelko, Larry V. Knight, R. Steven Turley, and Oleg F. Yakushev "Intense XUV source of radiation within the 4- to 45-nm spectral range based on capillary discharge plasmas", Proc. SPIE 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II, (14 November 2001); https://doi.org/10.1117/12.448459
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Cited by 5 scholarly publications.
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KEYWORDS
Capillaries

Plasmas

Spectroscopy

Extreme ultraviolet

Xenon

Grazing incidence

Ions

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