Paper
24 August 2001 CO2 laser doping of Si layers with use of B2O3 as an effective procedure for increasing the sensitivity of detectors in security systems
Wladyslaw Proszak, Olexander Bonchyk, Stepan Kiyak, Zenon Gotral
Author Affiliations +
Abstract
This paper presents results of researches related with solid state doping of Si layers with use CO2 laser irradiation and B203 dopant. Unique properties of laser doping process let us create 10-100 nm doped layers of repeatable parameters.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wladyslaw Proszak, Olexander Bonchyk, Stepan Kiyak, and Zenon Gotral "CO2 laser doping of Si layers with use of B2O3 as an effective procedure for increasing the sensitivity of detectors in security systems", Proc. SPIE 4535, Optical Sensing for Public Safety, Health, and Security, (24 August 2001); https://doi.org/10.1117/12.438441
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Cited by 1 scholarly publication.
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KEYWORDS
Silicon

Doping

Semiconductor lasers

Carbon dioxide lasers

Semiconductors

Laser processing

Semiconducting wafers

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