Designing photoresist systems for CO2-based microlithography

Devin Flowers; Erik N. Hoggan; Ruben G. Carbonell; Joseph M. DeSimone

doi:10.1117/12.474240

24 July 2002 Designing photoresist systems for CO₂-based microlithography

Devin Flowers, Erik N. Hoggan, Ruben G. Carbonell, Joseph M. DeSimone

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474240
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Carbon dioxide (CO₂) based microlithography (dry microlithography) represents an immense opportunity for the semiconductor industry to keep pace with Moore's Law while reducing its environmental impact. Currently, rinsing <130nm developed images with supercritical CO₂ is the only method which can prevent image collapse at this resolution. In this article, we will discuss CO₂'s ability to improve lithographic performance as we demonstrate its potential to replace the most solvent intensive steps of the microlithography process; spin coating, developing, and stripping. During these steps, semiconductor manufacturers produce vast amounts of organic and aqueous waste, which are detrimental to our ecosystem. However, before CO₂ can replace conventional solvents, photoresist systems must be designed and synthesized to be compatible with CO₂. These photoresists must be soluble in liquid CO₂ to insure that uniform thin-films can be produced by spin coating while maintaining characteristics of conventional resist systems such as low absorbance, high sensitivity, solubility contrast, good resolution, and etch resistance. Using our CO₂ compatible resist system, we will show the ability of CO₂ to spin coat uniform thin-films which (after exposing and PEB) can be developed using scCO₂ to produce lithography features that may be stripped in CO₂. Thus, revealing the enormous potential of CO₂ to provide the microlithography industry an opportunity to escape its water and organic solvent dependence.

Citation Download Citation

Devin Flowers, Erik N. Hoggan, Ruben G. Carbonell, and Joseph M. DeSimone "Designing photoresist systems for CO₂-based microlithography", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474240

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