Influence of 157-nm specific cleaning procedures on the quality of FIB repair depositions on reticles

Klaus Eisner; Christof M. Schilz; Alivina Williams; Stefan Hien; Martin Verbeek

doi:10.1117/12.474602

30 July 2002 Influence of 157-nm specific cleaning procedures on the quality of FIB repair depositions on reticles

Klaus Eisner, Christof M. Schilz, Alivina Williams, Stefan Hien, Martin Verbeek

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474602
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

An UV lamp cleaning system (172 nm) and a 157 nm laser have been used to irradiate Ga-based focused ion beam (FIB) repair depositions on 193 nm and 157 nm reticles. The thickness change of the depositions due to the irradiation has been measured using an atomic force microscope. For the 193 nm reticle additional transmission measurements were realized. These depositions are found to be highly resistant to UV lamp cleaning treatments of up to 18h (2mW/cm², 1% O₂). Extended tests were also done with 157 nm irradiation (9kJ/cm², 1 - 10ppm O₂). At the end of these tests a film loss of the depositions of 0.4nm /kJ/cm² and a transmission change of 10% could be determined.

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Klaus Eisner, Christof M. Schilz, Alivina Williams, Stefan Hien, and Martin Verbeek "Influence of 157-nm specific cleaning procedures on the quality of FIB repair depositions on reticles", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474602

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