Just-in-time adaptive disturbance estimation for run-to-run control of photolithography overlay

Stacy K. Firth; W. Jarrett Campbell; Thomas F. Edgar

doi:10.1117/12.475651

12 July 2002 Just-in-time adaptive disturbance estimation for run-to-run control of photolithography overlay

Stacy K. Firth, W. Jarrett Campbell, Thomas F. Edgar

Proceedings Volume 4692, Design, Process Integration, and Characterization for Microelectronics; (2002) https://doi.org/10.1117/12.475651
Event: Design, Process Integration, and Characterization for Microelectronics, 2002, Santa Clara, CA, United States

Abstract

One of the main challenges to implementations of traditional run-to-run control in the semiconductor industry is a high mix of products in a single factory. To address this challenge, Just-in-time Adaptive Disturbance Estimation (JADE) has been developed. JADE uses a recursive weighted least-squares parameters estimation technique to identify the contributions to variation that are dependent on product, as well as the tools on which the lot was processed. As applied to photolithography overlay, JADE assigns these sources of variation to contributions from the context items: tool, product, reference tool, and reference reticle. Simulations demonstrate that JADE effectively identifies disturbances in contributing context items when the variations are known to be additive. The superior performance of JADE over traditional EWMA is also shown in these simulations. The results of application of JADE to data from a high mix production facility show that JADE still performs better than EWMA, even with the challenges of a real manufacturing environment.

Citation Download Citation

Stacy K. Firth, W. Jarrett Campbell, and Thomas F. Edgar "Just-in-time adaptive disturbance estimation for run-to-run control of photolithography overlay", Proc. SPIE 4692, Design, Process Integration, and Characterization for Microelectronics, (12 July 2002); https://doi.org/10.1117/12.475651

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