Paper
1 August 2002 EPL data conversion system EPLON
Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, Tadao Inoue
Author Affiliations +
Abstract
We have developed the EPL mask data conversion system EPLON. It provides comprehensive capabilities necessary for the data conversion of EPL masks. This paper presents the features of each function and the evaluation result of data conversion with actual data on a full chip level. The result shows that the whole data conversion is possible within reasonable time for huge data. We also propose a new format for describing EPL mask data to deal with the huge size of EPL mask data after conversion. The format is called the EPLM format and it contains one main file and multiple subfield files.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, and Tadao Inoue "EPL data conversion system EPLON", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.477010
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Photomasks

Data conversion

Reticles

Data modeling

Semiconducting wafers

Charged-particle lithography

Computer simulations

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