Actual performance data obtained on new transmitted light mask metrology system

Klaus-Dieter Roeth; Gerhard W.B. Schlueter

doi:10.1117/12.479348

16 August 2002 Actual performance data obtained on new transmitted light mask metrology system

Klaus-Dieter Roeth, Gerhard W.B. Schlueter

Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479348
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany

Abstract

To keep pace with continuously shrinking design rules for masks and reticles Leica Microsystems has developed the new mask metrology tool LMS IPRO2. It is designed to measure pattern placement and CDs in transmitted light at i-line (365nm) illumination. Details on improvements over the previous system and performance data from the beta-site system are presented. The step to a shorter illumination wavelength leads to a better optical resolution power resulting in an improved edge detection. Transmitted light illumination enables to use the tool for CD measurement on quartz and phase shift masks.

Citation Download Citation

Klaus-Dieter Roeth and Gerhard W.B. Schlueter "Actual performance data obtained on new transmitted light mask metrology system", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); https://doi.org/10.1117/12.479348

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