Cleaning of low thermal expansion materials for low-defect EUVL mask substrates

Eva Krueger-Velthusen; Falk Friemel; Lutz Aschke; Frank Lenzen

doi:10.1117/12.479359

16 August 2002 Cleaning of low thermal expansion materials for low-defect EUVL mask substrates

Eva Krueger-Velthusen, Falk Friemel, Lutz Aschke, Frank Lenzen

Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479359
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany

Abstract

First tests for cleaning Zerodur were accomplished. Because there are only a few cleaning methods suitable for the removal of small particles down to 50 nm we have investigated the behaviour of Zerodur in DI water and aqueous solutions.

Citation Download Citation

Eva Krueger-Velthusen, Falk Friemel, Lutz Aschke, and Frank Lenzen "Cleaning of low thermal expansion materials for low-defect EUVL mask substrates", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); https://doi.org/10.1117/12.479359

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