Phase grating fabrication in glass via ion implantation

Istvan Banyasz; Miklos Fried; Csaba Duecso; Zofia Vertesy

doi:10.1117/12.472008

3 April 2003 Phase grating fabrication in glass via ion implantation

Istvan Banyasz, Miklos Fried, Csaba Duecso, Zofia Vertesy

Proceedings Volume 4944, Integrated Optical Devices: Fabrication and Testing; (2003) https://doi.org/10.1117/12.472008
Event: Photonics Fabrication Europe, 2002, Bruges, Belgium

Abstract

Transmission phase gratings have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks. Both mono- and multienergy implantations have been applied. Diffraction efficiencies of the gratings as function of the energy and dose of the ion implantation were measured.The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast-microscopy and scanning electron microscopy. Diffraction efficiencies up to 20 % have been obtained.

Citation Download Citation

Istvan Banyasz, Miklos Fried, Csaba Duecso, and Zofia Vertesy "Phase grating fabrication in glass via ion implantation", Proc. SPIE 4944, Integrated Optical Devices: Fabrication and Testing, (3 April 2003); https://doi.org/10.1117/12.472008

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