Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Meiten Koh; Takuji Ishikawa; Minoru Toriumi; Takayuki Araki; Tsuneo Yamashita; Hirokazu Aoyama; Tamio Yamazaki; Takamitsu Furukawa; Toshiro Itani

doi:10.1117/12.485077

12 June 2003 Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Meiten Koh, Takuji Ishikawa, Minoru Toriumi, Takayuki Araki, Tsuneo Yamashita, Hirokazu Aoyama, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Author Affiliations +

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485077
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We have synthesized various main-chain fluorinated polymers and studied their transparency and solubility. The main-chain fluorinated polymers were synthesized by co- or ter-polmerization of tetrafluoeoethylene (TFE) with cyclic monomers, especially TFE with newly synthesized norbornene derivatives. Transparency of the main-chain fluorinated polymers tended to be higher with higher fluorine contents. But exact absorbance of the main-chain fluorinated polymers by modifying the STUPID calculation. Solubility of the main-chain fluorinated polymers functionalized by hydroxyfluoroalkyl groups was also studied. We have developed a model to predict pKa of hydroxyfluoroalkyl groups incorporated in the norbornene derivatives, and studied correlation between pKa(OH) and solubility of the co-polymers of the hydroxyfluoroalkyl-functionalized norbornene derivatives with TFE. pKa Of the hydroxyfluoroalkyl groups were lower with higher fluorine contents, and solubility of the co-polymers tended to be higher with lower pKa of the hydroxyalkyl groups.

Citation Download Citation

Meiten Koh, Takuji Ishikawa, Minoru Toriumi, Takayuki Araki, Tsuneo Yamashita, Hirokazu Aoyama, Tamio Yamazaki, Takamitsu Furukawa, and Toshiro Itani "Synthesis of novel fluorinated norbornene derivatives for 157-nm application", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485077

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