Forbidden pitch or duty-free: revealing the causes of across-pitch imaging differences

Bruce W. Smith

doi:10.1117/12.485490

26 June 2003 Forbidden pitch or duty-free: revealing the causes of across-pitch imaging differences

Bruce W. Smith

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485490
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

As resist image responses vary with duty ratio, the identification of a particularly challenging instance leads to its classification as a “forbidden pitch.” The increased application of various RET methods has often resulted in the misuse of this label for anything unexplained by linear effects. This paper attempts to dispel the myths regarding the imaging variations that occur with pitch. Furthermore, by describing the basis of these behaviors, insight is provided for the appropriate design of mask, illumination, OPC, and exposure parameters to best accommodate a broad range of duty ratio values.

Citation Download Citation

Bruce W. Smith "Forbidden pitch or duty-free: revealing the causes of across-pitch imaging differences", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485490

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