Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry

Ivan Ohlidal; Miloslav Ohlidal; Petr Klapetek; Vladimir Cudek; Milos Jakl

doi:10.1117/12.509628

31 December 2003 Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry

Ivan Ohlidal, Miloslav Ohlidal, Petr Klapetek, Vladimir Cudek, Milos Jakl

Proceedings Volume 5182, Wave-Optical Systems Engineering II; (2003) https://doi.org/10.1117/12.509628
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

In this paper, a new optical method for characterizing nonuniform thin films is employed. For applying this method the special experimental arrangement containing CCD camera as a detector is used. Using this experimental arrangement the spectral dependencies of the local reflectances are obtained. After treating these experimental data of the distributions of the values of the local thicknesses and local refractive index along a large areas of the substrates of the nonuniform films are found. Moreover, it is shown that this method can be used to determine strong nonuniformities in both the optical parameters. The method is illustrated through the optical characterization of a nonuniform ZnSe epitaxial thin film deposited onto gallium arsenide single-crystal substrate and nonuniform film formed by the mixture of CN_x and SiO_y deposited onto silicon single-crystal substrate.

Citation Download Citation

Ivan Ohlidal, Miloslav Ohlidal, Petr Klapetek, Vladimir Cudek, and Milos Jakl "Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry", Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); https://doi.org/10.1117/12.509628

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