31 December 2003 Optical wave engineering for nanoscale surface metrology
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Proceedings Volume 5182, Wave-Optical Systems Engineering II; (2003); doi: 10.1117/12.511601
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States
Abstract
A novel approach to optical surface metrology in the nano-scale region was introduced recently. The approach is based on scanning of the interrogated space by specially structured light distributions and the analysis of the scattered light in the far field. For high resolution metrology, various dark beams as the scanning beams were found to be most effective. After a short overview of the measuring procedure, this paper addresses appropriate optical wave front engineering methods. These include the employment of diffractive optical elements designed for wave engineering within a three-dimensional section of space as well as laser beam structuring within the laser cavity.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph Shamir, Boris Spektor, Yurij Parkhomenko, "Optical wave engineering for nanoscale surface metrology", Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); doi: 10.1117/12.511601; https://doi.org/10.1117/12.511601
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