Paper
28 January 2004 High-resolution monochromators for the utilization of the radiation from an EUV free-electron laser
Luca Poletto, Paolo Azzolin, Giuseppe Tondello
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Abstract
We present the optical design of high-resolution monochromators for the utilization of the radiation from a FEL at 40 and 10 nm, in the framework of a proposal made from Elettra Synchrotron (Trieste, Italy) to the Italian Ministry of Education, Universities and Research for the construction and operation of an ultra-high brillance source in the UV and X region. Since the FEL emission is expected to be highly monochromatic (λ/Δλ≈10000), a monochromator is useful only if able to provide a spectral resolution higher than the intrinsic FEL resolution (λ/Δλ>100000). Two systems are presented: 1) normal-incidence configurations with multilayer-coated optics; 2) grazing-incidence configurations with a plane grating operated in conical diffraction. Normal-incidence configurations have very high spectral resolution, but the spectral band of operation is limited by the multilayer coating, so optics with different coatings have to be used when the FEL is tuned within the spectral region of operation. Configurations in conical diffraction have also very high resolution, high efficiency and a wide spectral band of operation.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luca Poletto, Paolo Azzolin, and Giuseppe Tondello "High-resolution monochromators for the utilization of the radiation from an EUV free-electron laser", Proc. SPIE 5194, Fourth-Generation X-Ray Sources and Ultrafast X-Ray Detectors, (28 January 2004); https://doi.org/10.1117/12.504162
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Cited by 1 scholarly publication.
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KEYWORDS
Mirrors

Monochromators

Diffraction

Diffraction gratings

Free electron lasers

Spectral resolution

Coating

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