Metal-dielectric light absorbers manufactured by ion plating

Michel Cathelinaud; Frederic Lemarquis; Jacques Loesel; Bernard Cousin

doi:10.1117/12.513409

25 February 2004 Metal-dielectric light absorbers manufactured by ion plating

Michel Cathelinaud, Frederic Lemarquis, Jacques Loesel, Bernard Cousin

Proceedings Volume 5250, Advances in Optical Thin Films; (2004) https://doi.org/10.1117/12.513409
Event: Optical Systems Design, 2003, St. Etienne, France

Abstract

In order to improve their mechanic and climatic properties, we studied the manufacturing of metal-dielectric light absorbers using an Ion Plating Process. The choice of the materials, Hf for the metal and SiO₂ for the dielectric, allows us of to use the deposition plant for either metal dielectric or all dielectric HfO₂-SiO₂ coatings without any change. After an index characterization of metallic films, we manufactured monochromatic and broad-band coatings. These coatings have been qualified for space environment.

Citation Download Citation

Michel Cathelinaud, Frederic Lemarquis, Jacques Loesel, and Bernard Cousin "Metal-dielectric light absorbers manufactured by ion plating", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.513409

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