Optimization and apodization of aerial images at high NA in imaging interferometic lithography

Thanis M. Tridhavee; Balu Santhanam; Steven R. J. Brueck

doi:10.1117/12.533149

28 May 2004 Optimization and apodization of aerial images at high NA in imaging interferometic lithography

Thanis M. Tridhavee, Balu Santhanam, Steven R. J. Brueck

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.533149
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Imaging Interferometric Lithography (IIL) offers several optimization parameters such as pupil filtering, parsing of frequency coverage, polarization control, and multiple exposure dosage ratios. We discuss the optimal frequency coverages for IIL at NA = .9 and the effects of the dark field (quadratic image autocorrelation terms) on the aerial image under pupil filtering. Next, comparisons are made of exposure latitudes for various dosage ratios and exposures for several weighted errors under different conditions. Lastly, apodization of the pupil filters is considered and shown to alleviate artifacts associated with Gibbs phenomena at hard frequency stops and improve overall image fidelity.

Citation Download Citation

Thanis M. Tridhavee, Balu Santhanam, and Steven R. J. Brueck "Optimization and apodization of aerial images at high NA in imaging interferometic lithography", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.533149

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