Paper
16 June 2004 Recent advances in the development of coherent and incoherent UV and EUV discharge sources
Vladimir M. Borisov, Andrei I. Demin, A. Eltzov, Alexander S. Ivanov, Oleg B. Khristoforov, Yuriy B. Kirykhin, Aleksandr Yu. Vinokhodov, V. A. Vodchits, Valentin A. Mischenko, Alexander V. Prokofiev
Author Affiliations +
Proceedings Volume 5479, Laser Optics 2003: High-Power Gas Lasers; (2004) https://doi.org/10.1117/12.558204
Event: Laser Optics 2003, 2003, St. Petersburg, Russian Federation
Abstract
We report on the experimental status of the development of compact high power (up to 500 W) high repetition rate (up to 6 kHz) excimer lasers and discharge produced plasma sources radiating in an extreme ultraviolet (EUV) region. EUV power more than 70 W (around 13.5 nm wavelength, a bandwidth of 2%) into 2π sr at 1250 Hz was obtained for continuous operation of a source.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir M. Borisov, Andrei I. Demin, A. Eltzov, Alexander S. Ivanov, Oleg B. Khristoforov, Yuriy B. Kirykhin, Aleksandr Yu. Vinokhodov, V. A. Vodchits, Valentin A. Mischenko, and Alexander V. Prokofiev "Recent advances in the development of coherent and incoherent UV and EUV discharge sources", Proc. SPIE 5479, Laser Optics 2003: High-Power Gas Lasers, (16 June 2004); https://doi.org/10.1117/12.558204
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet

Plasma

Excimer lasers

Xenon

Ultraviolet radiation

Pulsed laser operation

Lithography

RELATED CONTENT

Development of 250W EUV light source for HVM lithography
Proceedings of SPIE (February 22 2017)
High-power laser-produced-plasma EUV source
Proceedings of SPIE (July 01 2002)
EUV light source development in Japan
Proceedings of SPIE (November 18 2003)
High-harmonics from a UV laser plasma
Proceedings of SPIE (December 12 2003)

Back to Top