Both holographic and electron-beam recording in new carbazolyl-containing photoresists

Andrei M. Andries; Valeriu V. Bivol; Okan K. Ersoy; Stephan V. Robu; Sergei A. Sergeev; Lyudmila A. Vlad

doi:10.1117/12.582924

21 October 2004 Both holographic and electron-beam recording in new carbazolyl-containing photoresists

Andrei M. Andries, Valeriu V. Bivol, Okan K. Ersoy, Stephan V. Robu, Sergei A. Sergeev, Lyudmila A. Vlad

Proceedings Volume 5581, ROMOPTO 2003: Seventh Conference on Optics; (2004) https://doi.org/10.1117/12.582924
Event: ROMOPTO 2003: Seventh Conference on Optics, 2003, Constanta, Romania

Abstract

Electron-beam and holographic recording of diffraction gratings was processed in the layers of poly-N-poxypropylcarbazole (PEPC) and co-polymers of carbazolylalkylmethacrylate with octylmethacrylate (CAM:OMA) containing additions of CHI₃. The dependence of the diffraction efficiency of planar gratings on the recording current was studied. The influence of post-effect and storage in the dark on the diffraction efficiency is considered. By chemical development technique the reflecting relief diffraction gratings are obtained with the diffraction efficiency of 25-30%.

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Andrei M. Andries, Valeriu V. Bivol, Okan K. Ersoy, Stephan V. Robu, Sergei A. Sergeev, and Lyudmila A. Vlad "Both holographic and electron-beam recording in new carbazolyl-containing photoresists", Proc. SPIE 5581, ROMOPTO 2003: Seventh Conference on Optics, (21 October 2004); https://doi.org/10.1117/12.582924

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