Paper
19 January 2005 Properties of ZnO nanotips selectively grown by MOCVD
Hanhong Chen, Jian Zhong, Gaurav Saraf, Zheng Zhang, Yicheng Lu, Linus A. Fetter, Chien-Shing Pai
Author Affiliations +
Proceedings Volume 5592, Nanofabrication: Technologies, Devices, and Applications; (2005) https://doi.org/10.1117/12.571509
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States
Abstract
We report the catalyst-free growth of ZnO nanotips by metalorganic chemical vapor deposition (MOCVD) on various substrates, including c-sapphire, (100) Si, titanium, glass and SiO2. Structural, optical, and electrical properties of ZnO nanotips are investigated. ZnO nanotips are found to be single crystalline and oriented along the c-axis normal to the growth plane. The nanotips exhibit dominant free excitonic transition and enhanced luminescence efficiency with negligible deep-level emission. Controllable in situ Ga doping during MOCVD growth reduces the resistivity of ZnO nanotips. Selective growth of ZnO nanotips has been achieved on patterned Ti/r-Al2O3, SiO2/r-Al2O3, and silicon-on-sapphire (SOS) substrates. It provides the potential to integrate ZnO nanotips and ZnO epitaxial films on a single patterned substrate for various device applications.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hanhong Chen, Jian Zhong, Gaurav Saraf, Zheng Zhang, Yicheng Lu, Linus A. Fetter, and Chien-Shing Pai "Properties of ZnO nanotips selectively grown by MOCVD", Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, (19 January 2005); https://doi.org/10.1117/12.571509
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Cited by 8 scholarly publications.
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KEYWORDS
Zinc oxide

Metalorganic chemical vapor deposition

Silicon

Glasses

Gallium

Titanium

Computer engineering

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