Layout and source dependent transmission tuning

Chris Progler; Will Conley; Bob Socha; Young Ham

doi:10.1117/12.601770

12 May 2005 Layout and source dependent transmission tuning

Chris Progler, Will Conley, Bob Socha, Young Ham

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.601770
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Progress in photomask technology, exposure system flexibility and lithographic computation has enabled the practical exploration of jointly optimized lithographic imaging variables. The interaction between certain components, such as mask and illuminator, allows co-optimized solutions to frequently achieve better results when compared with sequential, single factor optimizations. In this work, we focus on the automated co-optimization of embedded phase shift mask transmission factor and exposure system illumination source profile for improving image based merit functions. Algorithm descriptions are provided and the critical interaction of optimization parameters with mask layout is highlighted. Our co-optimization algorithm is exercised on the more challenging random logic case and the concept of manipulating or restricting layout conditions to improve the achieved merit function is studied. Finally, suggestions for the experimental prototyping of solutions are provided and an assessment on deviating from the industry accepted 6% transmission discussed.

Citation Download Citation

Chris Progler, Will Conley, Bob Socha, and Young Ham "Layout and source dependent transmission tuning", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.601770

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