Theoretical analysis of atom focusing for nanostructure fabrication

Xian Zhong Chen; Ting Wen Xing; Guo Bin Yu; Xu Nan Chen; Han Min Yao

doi:10.1117/12.607464

8 December 2004 Theoretical analysis of atom focusing for nanostructure fabrication

Xian Zhong Chen, Ting Wen Xing, Guo Bin Yu, Xu Nan Chen, Han Min Yao

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607464
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

The two-level atom focusing in a Gaussian standing wave laser field was analyzed from the perspective of both classical mechanics and wave mechanics. The effects of source imperfection such as velocity spread and beam spread on atom focusing were analyzed by numerically integrating the classical equation of atomic motion. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the standing wave laser field as a function of traveling distance. In the absence of source imperfection, the contribution of diffractive aberration originating from the wave nature of the atom to broadening of feature width is larger than that of spherical aberration. Several methods for improving atom lithography experiments were presented.

Citation Download Citation

Xian Zhong Chen, Ting Wen Xing, Guo Bin Yu, Xu Nan Chen, and Han Min Yao "Theoretical analysis of atom focusing for nanostructure fabrication", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607464

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