PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The experimental investigation of a novel technical approach for formation of security diffraction structures with high degree of protection based on a combined optical and electron-beam lithography techniques are presented.
Andrei M. Andriesh,Valeriu V. Bivol,Okan K. Ersoy,Serghei A. Sergeev,Ghenadii M. Triduh,Alexandr Prisacar, andStefan V. Robu
"Formation of the anticounterfeiting hologram stickers on the base of combined optical and e-beam lithography", Proc. SPIE 5822, Information Technologies 2004, (21 February 2005); https://doi.org/10.1117/12.612301
ACCESS THE FULL ARTICLE
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Andrei M. Andriesh, Valeriu V. Bivol, Okan K. Ersoy, Serghei A. Sergeev, Ghenadii M. Triduh, Alexandr Prisacar, Stefan V. Robu, "Formation of the anticounterfeiting hologram stickers on the base of combined optical and e-beam lithography," Proc. SPIE 5822, Information Technologies 2004, (21 February 2005); https://doi.org/10.1117/12.612301