Exploring the fundamental limit of CD control: a measurement of shot noise induced CDU in e-beam lithography

Ming L. Yu; Allan Sagle; Benny Buller

doi:10.1117/12.637293

16 June 2005 Exploring the fundamental limit of CD control: a measurement of shot noise induced CDU in e-beam lithography

Ming L. Yu, Allan Sagle, Benny Buller

Author Affiliations +

Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637293
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany

Abstract

We have used our Quadra lithography system to evaluate the shot-noise-induced critical dimension uniformity (CDU). We found that at the isofocal dose, the shot-noise-induced CDU is directly proportional to the edge blur, and hence the rate of CD changes with dose. This emphasizes the importance of minimizing beam blur of the system. We used a phenomenological model to analyze our experimental data. The model included the counting statistics of the incident electrons and that of the electron induced chemistry. With the proper parameters, this model matches the experimental observations well. It also predicts the limit of the improvements and suggests guides for the optimization of the lithographic process.

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Ming L. Yu, Allan Sagle, and Benny Buller "Exploring the fundamental limit of CD control: a measurement of shot noise induced CDU in e-beam lithography", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); https://doi.org/10.1117/12.637293

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