Electrostatic membrane deformable mirror characterization and applications

Keith Bush; Anthony Marrs; Michael Schoen

doi:10.1117/12.621113

18 August 2005 Electrostatic membrane deformable mirror characterization and applications

Keith Bush, Anthony Marrs, Michael Schoen

Proceedings Volume 5894, Advanced Wavefront Control: Methods, Devices, and Applications III; 58940E (2005) https://doi.org/10.1117/12.621113
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Electrostatic Membrane Deformable Mirror (MDM) technology developed using silicon bulk micro-machining techniques offers the potential of providing low-cost, compact wavefront control systems for diverse optical system applications. Electrostatic mirror construction using bulk micro-machining allows for custom designs to satisfy wavefront control requirements for most optical systems. An electrostatic MDM consists of a thin membrane, generally with a thin metal or multi-layer high-reflectivity coating, suspended over an actuator pad array that is connected to a high-voltage driver. Voltages applied to the array elements deflect the membrane to provide an optical surface capable of correcting for measured optical aberrations in a given system. Electrostatic membrane DM designs are derived from well-known principles of membrane mechanics and electrostatics, the desired optical wavefront control requirements, and the current limitations of mirror fabrication and actuator drive electronics. MDM performance is strongly dependent on mirror diameter and air damping in meeting desired spatial and temporal frequency requirements. In this paper, we discuss characterization measurements and modeling of MDM spatial and temporal performance for different mirror designs and present application results illustrating the diverse uses of MDM technology in optical wavefront compensation systems.

Citation Download Citation

Keith Bush, Anthony Marrs, and Michael Schoen "Electrostatic membrane deformable mirror characterization and applications", Proc. SPIE 5894, Advanced Wavefront Control: Methods, Devices, and Applications III, 58940E (18 August 2005); https://doi.org/10.1117/12.621113

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