Development of short pulse and high power CO2 laser for EUV lithography

Akira Endo; Hideo Hoshino; Tatsuya Ariga; Taisuke Miura

doi:10.1117/12.616342

31 August 2005 Development of short pulse and high power CO₂ laser for EUV lithography

Akira Endo, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura

Proceedings Volume 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II; 59180I (2005) https://doi.org/10.1117/12.616342
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Laser produced plasma EUV source is the candidate for high quality, 115 W EUV light source for the next generation lithography. Cost effective laser driver is the key requirement for the realization of the concept as a viable scheme. A CO₂ laser driven LPP system with a Xenon droplet target is therefore a promising light source alternative for EUV. We are developing a high power and high repetition rate CO₂ laser system to achieve 10 W intermediate focus EUV power. High conversion efficiency (CE) from the laser energy to EUV in-band energy is the primarily important issue for the concept to be realized. Numerical simulation analysis of a Xenon plasma target shows that a short laser pulse less than 15 ns is necessary to obtain a high CE by a CO₂ laser. This paper describes on the development of a CO₂ laser system with a short pulse length less than 15 ns, an average power of a few kW, and a repetition rate of 100 kHz based on RF-excited, axial flow CO₂ laser modules. Various issues are reported on the laser system design, namely l00W seeder, parasitic oscillation suppression, small signal gain and saturation fluence, and beam quality. Additional approach to increase the amplification efficiency is discussed. Acknowledgement: This work was supported by NEDO.

Citation Download Citation

Akira Endo, Hideo Hoshino, Tatsuya Ariga, and Taisuke Miura "Development of short pulse and high power CO₂ laser for EUV lithography", Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59180I (31 August 2005); https://doi.org/10.1117/12.616342

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