Development of the automatic recipe generation system for CD-SEM using design data

Ryoichi Matsuoka; Atsushi Miyamoto; Wataru Nagatomo; Hidetoshi Morokuma; Takumichi Sutani

doi:10.1117/12.661936

24 March 2006 Development of the automatic recipe generation system for CD-SEM using design data

Ryoichi Matsuoka, Atsushi Miyamoto, Wataru Nagatomo, Hidetoshi Morokuma, Takumichi Sutani

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61524N (2006) https://doi.org/10.1117/12.661936
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

This study examines the "Multifactor Layout Analysis Method: MLA Method" newly developed for automatically detecting an appropriate addressing point and an auto focus point in the automatic generation of a measurement recipe for CD-SEM using design data. The MLA method is a unique pattern shape evaluation method capable of searching for the optimum addressing and auto focus points with a higher speed and accuracy than by the conventional methods, depending on the detailed information about the shape of a semiconductor pattern, which is contained in the design data. A recipe using the result of search by the MLA method has the same performance as that of a recipe generated by an experienced operator. This paper outlines the MLA method and reports on the result of experiments by this method and its practical applicability.

Citation Download Citation

Ryoichi Matsuoka, Atsushi Miyamoto, Wataru Nagatomo, Hidetoshi Morokuma, and Takumichi Sutani "Development of the automatic recipe generation system for CD-SEM using design data", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61524N (24 March 2006); https://doi.org/10.1117/12.661936

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