A Concept For A High Resolution Optical Lithographic System For Producing One-Half Micron Linewidths

George O. Reynolds

doi:10.1117/12.963726

20 August 1986 A Concept For A High Resolution Optical Lithographic System For Producing One-Half Micron Linewidths

George O. Reynolds

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963726
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

This paper describes a concept for developing an optical printer having a one-half micron linewidth capability to meet the pro-jected needs of future Integrated Circuit (IC) production facilities. Our approach for meeting this objective is to combine the appro-priate features of the current 1:1 reflective optical printers with the stepping characteristic of the 10:1 refractive optical systems. The proposed, very deep, UV step and repeat system has the potential of reaching a one-half micron linewidth production goal entirely with optical technology. The key subsystem elements necessary to achieve these goals are discussed. These subsystems include a reflective optical system, a 10:1 stepper configuration having a linearity limit of 0.5 microns and an FOV of 15 mm, a deep UV laser source, photoresists having the required sensitivity, an alignment capability of 500 Å , a focal sensor having a 500 Å tolerance and the associated mechanical, electronic and environmental controls compatible with a produc-tion throughput of 60-four inch wafers/hour.

Citation Download Citation

George O. Reynolds "A Concept For A High Resolution Optical Lithographic System For Producing One-Half Micron Linewidths", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963726

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