A new critical dimension metrology for chrome-on-glass substrates based on S-parameter measurements extracted from coplanar waveguide test structures

Chidubem A. Nwokoye; Mona Zaghloul; Michael W. Cresswell; Richard A. Allen; Christine E. Murabito

doi:10.1117/12.686706

20 October 2006 A new critical dimension metrology for chrome-on-glass substrates based on s-parameter measurements extracted from coplanar waveguide test structures

Chidubem A. Nwokoye, Mona Zaghloul, Michael W. Cresswell, Richard A. Allen, Christine E. Murabito

Author Affiliations +

Proceedings Volume 6349, Photomask Technology 2006; 634946 (2006) https://doi.org/10.1117/12.686706
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

The technical objective of the work reported here is to assess whether radio-frequency (RF) measurements made on coplanar waveguide (CPW) test structures, which are replicated in conducting material on insulating substrates, could be employed to extract the critical dimension (CD) of the signal line using its center-to-center separation from the groundlines as a reference. The specific near-term objective is to assess whether this CPW-based CD-metrology has sensitivity and repeatability competitive with the other metrology techniques that are now used for chrome-on-glass (COG) photomasks. An affirmative answer is encouraging because advancing to a non-contact and non-vacuum implementation would then seem possible for this application. Our modeling of specific cases shows that, when the pitch of the replicated lines of the CPW is maintained constant, the sensitivity of its characteristic impedance to the CDs of the signal and ground lines is approximately 60 Ω/μm. This is a potentially useful result. For the same implementation, the quantity ∂C/∂w has a value of approximately 45 (pF/m)/μm, which appears to be large enough to provide acceptable accuracy.

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Chidubem A. Nwokoye, Mona Zaghloul, Michael W. Cresswell, Richard A. Allen, and Christine E. Murabito "A new critical dimension metrology for chrome-on-glass substrates based on s-parameter measurements extracted from coplanar waveguide test structures", Proc. SPIE 6349, Photomask Technology 2006, 634946 (20 October 2006); https://doi.org/10.1117/12.686706

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