Development of optical component for EUV phase-shift microscopes

Yoshio Mizuta; Masafumi Osugi; Jyunki Kishimoto; Noriyuki Sakaya; Kazuhiro Hamamoto; Takeo Watanabe; Hiroo Kinoshita

doi:10.1117/12.711997

21 March 2007 Development of optical component for EUV phase-shift microscopes

Yoshio Mizuta, Masafumi Osugi, Jyunki Kishimoto, Noriyuki Sakaya, Kazuhiro Hamamoto, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651733 (2007) https://doi.org/10.1117/12.711997
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

This paper is described about fabrication and evaluation of the beam splitter used in an EUV region. This beam splitter has to be as a free standing, stress control of multilayer is main subject. It is investigated that the dependence of the intrinsic stress between a RF (DC) sputtering power and an argon pressure during the thin film deposition processes. At the low argon pressure, molybdenum and silicon films showed both high compressive stress. However, at the high argon pressure, the molybdenum and silicon films showed low tensile stress and low compressive stress, respectively. Therefore, it was possible to fabricate a multilayer films with low tensile stress by optimizing the argon pressure and applied RF power during deposition. Conclusively, a free-standing semitrasparent multilayer film of 8x22 mm area was fabricated. It shows high reflectance and transmission of near 25% at the wavelength of EUV region.

Citation Download Citation

Yoshio Mizuta, Masafumi Osugi, Jyunki Kishimoto, Noriyuki Sakaya, Kazuhiro Hamamoto, Takeo Watanabe, and Hiroo Kinoshita "Development of optical component for EUV phase-shift microscopes", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651733 (21 March 2007); https://doi.org/10.1117/12.711997

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