Automatic setup of in-line critical dimension (CD) recipes during OPC qualification in a foundry environment

Yasri Yudhistira; Quek Shyue Fong; Chan Sun Sun; Koh Hui Peng; Rachel Ren; Sern Loong Ng; Amit Siany; Shimon Levi

doi:10.1117/12.712534

4 April 2007 Automatic setup of in-line critical dimension (CD) recipes during OPC qualification in a foundry environment

Yasri Yudhistira, Quek Shyue Fong, Chan Sun Sun, Koh Hui Peng, Rachel Ren, Sern Loong Ng, Amit Siany, Shimon Levi

Author Affiliations +

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 651809 (2007) https://doi.org/10.1117/12.712534
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In this paper, we study the feasibility of using a new system to set up offline critical dimension scanning electron microscope (CDSEM) recipes for both litho and etch processes monitoring in a foundry environment before first silicon. We will automatically create CDSEM measurement recipes based on CAD design data (2) and litho illumination information. The main advantages of having recipes setup done through this method as compared to performing recipe creation on the CDSEM tool itself are the reduction in CD-SEM tool usage and more importantly, the availability of the recipes before the first wafer is being processed in lithography resulting in a faster of cycle time for new devices. To facilitate our objective, a new feature was implemented in the design to provide a universal global alignment (GA) feature under both optical and SEM view. The global alignment serves two functions: to minimize device-to-device and layer-to-layer optical variation. It synchronizes design (CAD) and wafer coordinate systems. With this universal alignment feature available across all production layers of interest, we can fully automate recipe creation process from design to production.

Citation Download Citation

Yasri Yudhistira, Quek Shyue Fong, Chan Sun Sun, Koh Hui Peng, Rachel Ren, Sern Loong Ng, Amit Siany, and Shimon Levi "Automatic setup of in-line critical dimension (CD) recipes during OPC qualification in a foundry environment", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651809 (4 April 2007); https://doi.org/10.1117/12.712534

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Optical proximity correction

Computer aided design

Semiconducting wafers

Pattern recognition

Scanning electron microscopy

Optical alignment

Data modeling

Show All Keywords

Keywords/Phrases

Search In:

Publication Years