Data sharing system for lithography APC

Eiichi Kawamura; Yoshiharu Teranishi; Masanori Shimabara

doi:10.1117/12.711246

5 April 2007 Data sharing system for lithography APC

Eiichi Kawamura, Yoshiharu Teranishi, Masanori Shimabara

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65182S (2007) https://doi.org/10.1117/12.711246
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We have developed a simple and cost-effective data sharing system between fabs for lithography advanced process control (APC). Lithography APC requires process flow, inter-layer information, history information, mask information and so on. So, inter-APC data sharing system has become necessary when lots are to be processed in multiple fabs (usually two fabs). The development cost and maintenance cost also have to be taken into account. The system handles minimum information necessary to make trend prediction for the lots. Three types of data have to be shared for precise trend prediction. First one is device information of the lots, e.g., process flow of the device and inter-layer information. Second one is mask information from mask suppliers, e.g., pattern characteristics and pattern widths. Last one is history data of the lots. Device information is electronic file and easy to handle. The electronic file is common between APCs and uploaded into the database. As for mask information sharing, mask information described in common format is obtained via Wide Area Network (WAN) from mask-vender will be stored in the mask-information data server. This information is periodically transferred to one specific lithography-APC server and compiled into the database. This lithography-APC server periodically delivers the mask-information to every other lithography-APC server. Process-history data sharing system mainly consists of function of delivering process-history data. In shipping production lots to another fab, the product-related process-history data is delivered by the lithography-APC server from the shipping site. We have confirmed the function and effectiveness of data sharing systems.

Citation Download Citation

Eiichi Kawamura, Yoshiharu Teranishi, and Masanori Shimabara "Data sharing system for lithography APC", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65182S (5 April 2007); https://doi.org/10.1117/12.711246

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KEYWORDS

Photomasks

Lithography

Data processing

Databases

Process control

Back end of line

Telecommunications

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