Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters

Juan Manuel Russo; Jose E. Castillo; Raymond K. Kostuk

doi:10.1117/12.732572

13 September 2007 Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters

Juan Manuel Russo, Jose E. Castillo, Raymond K. Kostuk

Proceedings Volume 6653, Linear and Nonlinear Optics of Organic Materials VII; 66530D (2007) https://doi.org/10.1117/12.732572
Event: Photonic Devices + Applications, 2007, San Diego, California, United States

Abstract

The good optical properties of PQ (phenanthrenequinone)-doped PMMA (poly methylmethacrylate) and its flexibility to fabricate different substrate configurations make this material attractive for holographic recording. In previous work, filters in PQ/PMMA for Wavelength Division Multiplexing (WDM) and Optical Code Division Multiple Access (OCDMA) were demonstrated and shown to have a 0.03nm/°C thermal tuning range operating near 1550nm. In this paper we investigate the effect of adding silicon dioxide nanoparticles to PQ/PMMA in order to measure the thermal tuning range and investigate the performance of these filters.

Citation Download Citation

Juan Manuel Russo, Jose E. Castillo, and Raymond K. Kostuk "Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters", Proc. SPIE 6653, Linear and Nonlinear Optics of Organic Materials VII, 66530D (13 September 2007); https://doi.org/10.1117/12.732572

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