Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors

A. Rommeveaux; L. Assoufid; H. Ohashi; H. Mimura; K. Yamauchi; J. Qian; T. Ishikawa; C. Morawe; A. T. Macrander; A. Khounsary; S. Goto

doi:10.1117/12.736171

27 September 2007 Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, S. Goto

Author Affiliations +

Proceedings Volume 6704, Advances in Metrology for X-Ray and EUV Optics II; 67040B (2007) https://doi.org/10.1117/12.736171
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

The first series of metrology round-robin measurements carried out in 2005 at the APS, ESRF and SPring-8 metrology laboratories involving two flat x-ray mirrors and a cylindrical x-ray mirror has shown excellent agreement among the three facilities' Long Trace Profilers (LTP) despite their architectural differences. Because of the growing interest in diffraction-limited hard x-ray K-B focusing mirrors, it was decided to extend the round robin measurements to spherical and aspheric x-ray mirrors. The strong surface slope variation of these mirrors presents a real challenge to LTP. As a result, new LTP measurement protocol has to be developed and implemented to ensure measurement accuracy and consistency. In this paper, different measurement techniques and procedures will be described, the results will be discussed, and comparison will be extended to micro-stitching interferometry measurements performed at Osaka University, Japan.

Citation Download Citation

A. Rommeveaux, L. Assoufid, H. Ohashi, H. Mimura, K. Yamauchi, J. Qian, T. Ishikawa, C. Morawe, A. T. Macrander, A. Khounsary, and S. Goto "Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors", Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 67040B (27 September 2007); https://doi.org/10.1117/12.736171

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available