Thin film thickness profile measurement using an interferometric surface profiler

Katsuichi Kitagawa

doi:10.1117/12.754178

10 October 2007 Thin film thickness profile measurement using an interferometric surface profiler

Katsuichi Kitagawa

Proceedings Volume 6716, Optomechatronic Sensors and Instrumentation III; 671607 (2007) https://doi.org/10.1117/12.754178
Event: International Symposium on Optomechatronic Technologies, 2007, Lausanne, Switzerland

Abstract

The technique of surface profile measurement using white-light interferometry is widely used in industry. However, its application to transparent thin films has been limited to date because the reflection signals from the front and back surfaces are mixed and must be separated in order to obtain correct measurements. This paper introduces four of our recent developments in this application field: 1) profiling of a thick transparent film, 2) profiling of a thin transparent film, 3) thickness profiling of a freestanding film, and 4) simultaneous measurement of the thickness and refractive index of a freestanding film.

Citation Download Citation

Katsuichi Kitagawa "Thin film thickness profile measurement using an interferometric surface profiler", Proc. SPIE 6716, Optomechatronic Sensors and Instrumentation III, 671607 (10 October 2007); https://doi.org/10.1117/12.754178

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available