Matching the residual stress between Hafnia and silica for high reflective mirrors

Jiangchuan Hu; Songlin Cheng; Ping Ma; Jin Luo; Zheng Wang

doi:10.1117/12.783379

14 November 2007 Matching the residual stress between Hafnia and silica for high reflective mirrors

Jiangchuan Hu, Songlin Cheng, Ping Ma, Jin Luo, Zheng Wang

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67222V (2007) https://doi.org/10.1117/12.783379
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

The effects of coating parameters on the stress of silica coating, Hafnia coating have been studied. The aforementioned parameters are the angle of coating tooling, partial oxygen pressure during deposition. The experimental study shows that the parameters are two important parameters. To reduce the compress stress of silica, silica should be deposited at small angle of coating tooling and high partial oxygen pressure. The angle of coating tooling must be small and partial oxygen pressure must be higher still for the Hafnia coatings. According to the stress character of silica coating and Hafnia coating, the stresses are matched in a high reflection mirror. In this deposition technology, the high reflection mirrors also have high laser induce threshold. Which are satisfied the imposed requirement by power laser specifications.

Citation Download Citation

Jiangchuan Hu, Songlin Cheng, Ping Ma, Jin Luo, and Zheng Wang "Matching the residual stress between Hafnia and silica for high reflective mirrors", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67222V (14 November 2007); https://doi.org/10.1117/12.783379

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