Paper
14 February 2008 Anisotropic transformation of the beam quality of DPSS lasers for shaping of a narrow line focus for laser crystallization of Si
Mikhail Ivanenko, Alexei Mikhailov, Yuri Miklyaev, Wyacheslaw Grimm, Klaus Bagschik, Andreas Hildebrandt, Vitalij Lissotschenko
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Abstract
Advanced laser crystallization of Si for flat panel displays demands a narrow line-shaped light focus with an ultimately high homogeneity. Key element of LIMO line shaping system is an anisotropic quality transformation of a multimode laser beam, which permits a very good homogenization for the long axis and tight focusing with a large depth of focus for the perpendicular high-quality axis. A prototype system has been built with a 90-W 532-nm DPSS laser. It provides a 59-mm long and down to 8 μm (FWHM) narrow focus with a residual inhomogeneity of only 1% (rms). The focus width is adjustable and its shape can be tuned from a quasi-Gauss to a top-hat intensity distribution. The depth of focus at 90% of the peak intensity DOF0.9I varies from 120 μm for a line width of 8 μm to 275 μm for FWHM = 14 μm. The design of longer lines is in progress at LIMO.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mikhail Ivanenko, Alexei Mikhailov, Yuri Miklyaev, Wyacheslaw Grimm, Klaus Bagschik, Andreas Hildebrandt, and Vitalij Lissotschenko "Anisotropic transformation of the beam quality of DPSS lasers for shaping of a narrow line focus for laser crystallization of Si", Proc. SPIE 6879, Photon Processing in Microelectronics and Photonics VII, 68790P (14 February 2008); https://doi.org/10.1117/12.762091
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KEYWORDS
Laser crystals

Diode pumped solid state lasers

Silicon

Crystals

Semiconductor lasers

Homogenization

Prototyping

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