Broadband diffuser for an IR illumination system

Robert E. Hutchins; Steve Tidwell; Jessica L. Wargats

doi:10.1117/12.765644

22 February 2008 Broadband diffuser for an IR illumination system

Robert E. Hutchins, Steve Tidwell, Jessica L. Wargats

Proceedings Volume 6912, Practical Holography XXII: Materials and Applications; 69120D (2008) https://doi.org/10.1117/12.765644
Event: Integrated Optoelectronic Devices 2008, 2008, San Jose, California, United States

Abstract

Many applications, both in commercial and defense industries, require uniform diffusion at either a broad wavelength range, or at multiple discrete wavelengths. Currently employed technologies have trade-off's between their ability to control the angular distribution and uniformity of the output beams intensity profile, and the ability to suppress 0th order for the devices in a way that can be volume manufactured to tolerate environmental extremes. At Tessera, we have developed a binary lithography technique which nearly eliminates the 0th order over a much broadened wavelength range, while maintaining much greater control over the angular distribution of the beam. In this paper we describe technology and how it has been applied to the design and manufacture of a top-hat diffuser profile for the wavelengths of 3.95μm and 4.6μm. The procedures used for testing, as well as the test results, are provided courtesy of Aculight Corporation.

Citation Download Citation

Robert E. Hutchins, Steve Tidwell, and Jessica L. Wargats "Broadband diffuser for an IR illumination system", Proc. SPIE 6912, Practical Holography XXII: Materials and Applications, 69120D (22 February 2008); https://doi.org/10.1117/12.765644

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