Automated CD-SEM metrology for efficient TD and HVM

Alexander Starikov; Satya P. Mulapudi

doi:10.1117/12.778973

24 March 2008 Automated CD-SEM metrology for efficient TD and HVM

Alexander Starikov, Satya P. Mulapudi

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 69221V (2008) https://doi.org/10.1117/12.778973
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

CD-SEM is the metrology tool of choice for patterning process development and production process control. We can make these applications more efficient by extracting more information from each CD-SEM image. This enables direct monitors of key process parameters, such as lithography dose and focus, or predicting the outcome of processing, such as etched dimensions or electrical parameters. Automating CD-SEM recipes at the early stages of process development can accelerate technology characterization, segmentation of variance and process improvements. This leverages the engineering effort, reduces development costs and helps to manage the risks inherent in new technology. Automating CD-SEM for manufacturing enables efficient operations. Novel SEM Alarm Time Indicator (SATI) makes this task manageable. SATI pulls together data mining, trend charting of the key recipe and Operations (OPS) indicators, Pareto of OPS losses and inputs for root cause analysis. This approach proved natural to our FAB personnel. After minimal initial training, we applied new methods in 65nm FLASH manufacture. This resulted in significant lasting improvements of CD-SEM recipe robustness, portability and automation, increased CD-SEM capacity and MT productivity.

Citation Download Citation

Alexander Starikov and Satya P. Mulapudi "Automated CD-SEM metrology for efficient TD and HVM", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221V (24 March 2008); https://doi.org/10.1117/12.778973

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KEYWORDS

Metrology

Critical dimension metrology

Semiconducting wafers

Manufacturing

Scanning electron microscopy

Etching

Image processing

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