Novel molecular resist based on an amorphous truxene derivative

Shigeki Hattori; Satoshi Saito; Koji Asakawa; Takeshi Koshiba; Tetsuro Nakasugi

doi:10.1117/12.770944

26 March 2008 Novel molecular resist based on an amorphous truxene derivative

Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69230J (2008) https://doi.org/10.1117/12.770944
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A novel molecular resist based on a new amorphous molecule, a truxene derivative, was designed and synthesized. Truxene is characterized as an amorphous solid with a high glass transition temperature (T_g). 70 nm line-and-space (1 : 1) positive pattern was fabricated by the exposure of a low-energy electron beam (5 keV) using the new molecular resist. The new molecular design of resists based on the truxene derivative is promising with regard to development of more efficient molecular resists.

Citation Download Citation

Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, and Tetsuro Nakasugi "Novel molecular resist based on an amorphous truxene derivative", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69230J (26 March 2008); https://doi.org/10.1117/12.770944

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