Fabrication and characterization of Si nanotip arrays for Si-based nano-devices

Xiangao Zhang; Kui Liu; Kunji Chen; Jun Xu; Zhongyuan Ma; Wei Li; Ling Xu; Xinfan Huang

doi:10.1117/12.792018

11 March 2008 Fabrication and characterization of Si nanotip arrays for Si-based nano-devices

Xiangao Zhang, Kui Liu, Kunji Chen, Jun Xu, Zhongyuan Ma, Wei Li, Ling Xu, Xinfan Huang

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 698426 (2008) https://doi.org/10.1117/12.792018
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

A simple and efficient technique for fabricating two-dimensional arrays of silicon nanotips by using electron beam lithography (EBL) and reactive ion etching (RIE) was reported. For the RIE processes, two kind of reactive gases, CHF₃ and SF₆, were used as plasma etching source for Si. The experiment results indicate that the reactive ion etching mechanism is different: the isotropic process for SF₆ and anisotropic for CHF₃. It is found that the mixed O₂/SF₆ plasma etching can improve the properties of profile and surface of Si nanotips. Under the condition of ratio ~15%, the 10 nm top size of Si nanotips was obtained.

Citation Download Citation

Xiangao Zhang, Kui Liu, Kunji Chen, Jun Xu, Zhongyuan Ma, Wei Li, Ling Xu, and Xinfan Huang "Fabrication and characterization of Si nanotip arrays for Si-based nano-devices", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698426 (11 March 2008); https://doi.org/10.1117/12.792018

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