Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points

F. Horst; William M. J. Green; B. J. Offrein; Yurii Vlasov

doi:10.1117/12.781232

1 May 2008 Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points

F. Horst, William M. J. Green, B. J. Offrein, Yurii Vlasov

Proceedings Volume 6996, Silicon Photonics and Photonic Integrated Circuits; 69960R (2008) https://doi.org/10.1117/12.781232
Event: SPIE Photonics Europe, 2008, Strasbourg, France

Abstract

We present ultra-compact integrated optical echelle grating WDM (de-)multiplexers for on-chip optical networks. These devices are based on a design with two stigmatic points. The devices were fabricated using Silicon-On-Insulator (SOI) photonic waveguide technology thus the smallest version of the (de-)multiplexer occupies an area of only 250x200 μm. We will show measurement results on different variations of the echelle grating devices. In the measurements, we found a channel to channel isolation of 19 dB. The minimum insertion loss, relative to a straight waveguide, is only 3 dB with a channel to channel variation of 0.5 dB.nefit of the numerical reconstruction properties of DH in combination with diffraction grating to get super-resolution. Various attempts have been performed and results are presented and discussed. The approaches could be used for metrology and imaging application in various fields of engineering and biology.

Citation Download Citation

F. Horst, William M. J. Green, B. J. Offrein, and Yurii Vlasov "Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points", Proc. SPIE 6996, Silicon Photonics and Photonic Integrated Circuits, 69960R (1 May 2008); https://doi.org/10.1117/12.781232

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