Mask diffraction analysis and optimization for EUV masks

Andreas Erdmann; Peter Evanschitzky; Tim Fühner

doi:10.1117/12.814119

18 March 2009 Mask diffraction analysis and optimization for EUV masks

Andreas Erdmann, Peter Evanschitzky, Tim Fühner

Proceedings Volume 7271, Alternative Lithographic Technologies; 72711E (2009) https://doi.org/10.1117/12.814119
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

This paper employs a direct analysis of the intensity and the phase of the diffracted light by rigorous electromagnetic field (EMF) simulations to investigate mask-induced imaging artifacts in EUV-lithography. Analysis of the diffraction efficiencies and phase differences between the diffraction orders versus mask and illumination parameters is used to explore EUV-specific imaging artifacts such as feature orientation dependent placement errors and feature sizes, shifts of the best focus position, process window asymmetries, and other aberration-like phenomena. The results of these simulations aim to understand the reason for these EUV-specific imaging artifacts and to devise strategies for their compensation. Finally, rigorous EMF models of light scattering from EUV-masks are applied to identify ideal mask absorber stacks using global optimization techniques.

Citation Download Citation

Andreas Erdmann, Peter Evanschitzky, and Tim Fühner "Mask diffraction analysis and optimization for EUV masks", Proc. SPIE 7271, Alternative Lithographic Technologies, 72711E (18 March 2009); https://doi.org/10.1117/12.814119

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