Effect of line-width roughness on optical scatterometry measurements

Brent C. Bergner; Thomas A. Germer; Thomas J. Suleski

doi:10.1117/12.813770

23 March 2009 Effect of line-width roughness on optical scatterometry measurements

Brent C. Bergner, Thomas A. Germer, Thomas J. Suleski

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72720U (2009) https://doi.org/10.1117/12.813770
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Line width roughness (LWR) has been identified as a potential source of uncertainty in scatterometry measurements, and characterizing its effect is required to improve the method's accuracy and to make measurements traceable. In this work, we extend previous work by using rigorous coupled wave (RCW) analysis on two-dimensionally periodic structures to examine the effects of LWR. We compare the results with simpler models relying upon a number of effective medium approximations. We find that the effective medium approximations yield an approximate order of magnitude indicator of the effect, but that the quantitative agreement may not be good enough to include in scatterometry models.

Citation Download Citation

Brent C. Bergner, Thomas A. Germer, and Thomas J. Suleski "Effect of line-width roughness on optical scatterometry measurements", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720U (23 March 2009); https://doi.org/10.1117/12.813770

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