In-die registration metrology on future-generation reticles

Klaus-Dieter Roeth; Frank Laske; Hiroshi Kinoshita; Daisuke Kenmochi; Karl-Heinrich Schmidt; Dieter Adam

doi:10.1117/12.813944

23 March 2009 In-die registration metrology on future-generation reticles

Klaus-Dieter Roeth, Frank Laske, Hiroshi Kinoshita, Daisuke Kenmochi, Karl-Heinrich Schmidt, Dieter Adam

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72722W (2009) https://doi.org/10.1117/12.813944
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Today, mask metrology is performed on dedicated registration test patterns in the kerf area between active dies. Accordingly, the measurement performance of the actual registration metrology system on these test patterns is very well characterized. However, it is commonly understood that with the introduction of reticles for the 32nm technology node, the overlay requirements will become more stringent and therefore reticles need to be characterized in greater detail. In order to achieve the tighter overlay performance targets on the wafer, registration metrology on the mask is expected to include "active" structures in the die. There will be more of an emphasis on In-Die metrology if Double Patterning Lithography (DPL) will finally become the technology of choice for the 32nm lithography. Measurement results are obtained on state-of-the-art registration metrology tools on test reticles simulating metrology in the dense active array. These data are analyzed and compared with results achieved on test reticles using standard registration test patterns.

Citation Download Citation

Klaus-Dieter Roeth, Frank Laske, Hiroshi Kinoshita, Daisuke Kenmochi, Karl-Heinrich Schmidt, and Dieter Adam "In-die registration metrology on future-generation reticles", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72722W (23 March 2009); https://doi.org/10.1117/12.813944

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available