Capillary Z-pinch discharge produced plasma EUV source

Yongpeng Zhao; Qiang Xu; Xingqiang Zhang

doi:10.1117/12.823433

18 February 2009 Capillary Z-pinch discharge produced plasma EUV source

Yongpeng Zhao, Qiang Xu, Xingqiang Zhang

Proceedings Volume 7276, Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications; 72761J (2009) https://doi.org/10.1117/12.823433
Event: Photonics and Optoelectronics Meetings, 2008, Wuhan, China

Abstract

Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).

Citation Download Citation

Yongpeng Zhao, Qiang Xu, and Xingqiang Zhang "Capillary Z-pinch discharge produced plasma EUV source", Proc. SPIE 7276, Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications, 72761J (18 February 2009); https://doi.org/10.1117/12.823433

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available