Paper
17 June 2009 Photothermal measurement of absorptance losses, temperature-induced wavefront deformation, and compaction in DUV optics
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Abstract
A measurement system for quantitative registration of transient and irreversible lens effects in DUV optics induced by absorbed UV laser radiation was developed at the Laser-Laboratorium Göttingen. It is based upon a strongly improved Hartmann-Shack wavefront sensor with an extreme sensitivity of ~λ/10000 RMS @ 193nm, accomplishing precise online monitoring of wavefront deformations of a collimated test laser beam transmitted through the laser-irradiated site of a sample. Caused by the temperature dependence of the refractive index as well as thermal expansion and compaction, the initially plane wavefront of the test laser is distorted into a convex or concave lens, dependent on sign and magnitude of index change and expansion. The observed wavefront distortion yields a quantitative measure of the absorption losses in the sample. Some results for fused silica and CaF2 are presented.
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Bernd Schäfer, Bernhard Flöter, and Klaus Mann "Photothermal measurement of absorptance losses, temperature-induced wavefront deformation, and compaction in DUV optics", Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 73891D (17 June 2009); https://doi.org/10.1117/12.827501
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KEYWORDS
Wavefronts

Absorption

Quartz

Calibration

Adaptive optics

Sensors

Silica

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