Paper
2 September 2009 Critically coupled surface phonon-polariton excitation in silicon carbide
Author Affiliations +
Abstract
We observe critical coupling to surface phonon-polaritons in silicon carbide by attenuated total reflection of mid-infrared radiation. Reflectance measurements demonstrate critical coupling by a double-scan of wavelength and incidence angle. Critical coupling occurs when prism coupling loss is equal to losses in silicon carbide and the substrate, resulting in maximal electric field enhancement.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Burton Neuner III, Dmitriy Korobkin, Chris Fietz, Davy Carole, Gabriel Ferro, and Gennady Shvets "Critically coupled surface phonon-polariton excitation in silicon carbide", Proc. SPIE 7394, Plasmonics: Metallic Nanostructures and Their Optical Properties VII, 73942B (2 September 2009); https://doi.org/10.1117/12.825403
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon carbide

Reflectivity

Prisms

Silicon

Reflection

Mid-IR

Interfaces

Back to Top